Raith Voyager High Performance E-Beam Writer

The University of Alberta on behalf of the Faculty of Engineering, NanoFab, is sole sourcing the acquisition of a Raith Voyager High Performance E-Beam Writer. The department already is using a RAITH150 Two electron beam lithography (EBL) system at the NanoFAB. This new system has “traxx” which is a fixed-beam moving stage which is unique to Raith. Both the existing equipment and the VOYAGER use the same proprietary printing method technology which enables stitching error free lithography over long distances. The Raith technology has been used for the last twelve (12) years. Purchasing the Raith VOYAGER will preserve the well-established EBL process flows, documentation, system user expertise which is critical for continued research internally and with industry collaborators who have come to rely on this unique exposure mode for fabrication of their devices. This essentially is a complete replacement of the existing system with newer and faster technology using the same software and process flows.